Thin Film Laboratory

Our state-of-the-art infrastructure combines advanced magnetron sputtering systems, electron beam and thermal evaporation systems as well as atomic layer deposition capabilities.

This includes our flagship Advanced Thin Film Sputtering Fabrication Facility (TF-FAB), an EPSRC capital investment facility at Northumbria University, purpose-built to produce high-quality thin films with minimal impurities and defects for commercial and academic applications.

Our state-of-the-art infrastructure combines advanced magnetron sputtering systems with integrated characterisation capabilities, all housed within three specialised deposition laboratories featuring both chemical and physical vapour deposition technologies. The flagship TF-FAB system features dual chambers with four magnetrons, fast pumping and venting for exceptional turnaround times, and multiple power supply modes that enable diverse deposition processes across numerous applications. In-situ optical emission monitoring and sputtering bias capabilities provide unmatched flexibility and precision in controlling film stoichiometry and structure.

Our dedicated technical team works closely with each client - whether SMEs, large multinationals, or academic researchers - to define requirements, design optimal deposition processes, and deliver tailored solutions from sample preparation through final analysis.

Find out more about our facility via the video and links below. If you would like to submit an enquiry please contact us and we'll be in touch as soon as we can.